Technology ID
TAB-3116

A Full-Length Infectious cDNA Clone of Zika Virus from the 2015 Epidemic in Brazil as a Genetic Platform for Studies of Virus-Host Interactions and Vaccine Development

E-Numbers
E-114-2017-0
Lead Inventor
Pletnev, Alexander (NIAID)
Co-Inventors
Tsetsarkin, Konstantin (NIAID)
Applications
Vaccines­­­
Therapeutics
Research Materials
Diagnostics
Therapeutic Areas
Infectious Disease
Lead IC
NIAID
ICs
NIAID
An arthropod-borne virus, Zika virus (ZIKV), has recently emerged as a major human pathogen. Associated with complications during perinatal development and Guillain-Barré syndrome in adults, ZIKV raises new challenges for understanding the molecular determinants of flavivirus pathogenesis. This underscores the necessity for the development of a reverse genetic system based on an epidemic ZIKV strain. This technology relates to the generation and characterization in cell cultures of an infectious cDNA clone of ZIKV isolated from the 2015 epidemic in Brazil. The cDNA-derived ZIKV replicated efficiently in a variety of cell lines, including those of both neuronal and placental origin. It was observed that the growth of cDNA-derived virus was attenuated compared to the growth of the parental isolate in most cell lines, which correlates with substantial differences in sequence heterogeneity between these viruses that were determined by deep-sequencing analysis. Moreover, these results indicate that caution should be exercised when interpreting the results of reverse-genetics experiments in attempts to accurately predict the biology of natural viruses. Finally, a Vero cell-adapted cDNA clone of ZIKV was generated that can be used as a convenient platform for studies aimed at the development of ZIKV vaccines (live attenuated and inactivated) and therapeutics.
Commercial Applications
  • Diagnostics
  • Vaccines
  • Development of therapeutics
Competitive Advantages
  • Use in development of flavivirus vaccines
  • Virus growth in various cell lines
  • Developing and developed world research tool
Licensing Contact: